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2 edition of Tungsten and other advanced metals for ULSI applications in 1990 found in the catalog.

Tungsten and other advanced metals for ULSI applications in 1990

Workshop on Tungsten and Other Advanced Metals for ULSI Applications in 1990 (1990 Dallas)

Tungsten and other advanced metals for ULSI applications in 1990

proceedings of the 1990 workshop

by Workshop on Tungsten and Other Advanced Metals for ULSI Applications in 1990 (1990 Dallas)

  • 172 Want to read
  • 23 Currently reading

Published by Materials Research Society in Pittsburgh .
Written in English


Edition Notes

Statementeditors: Gregory C. Smith, Roc Blumenthal.
ContributionsSmith, Gregory C., Blumenthal, Roc., Materials Research Society.
ID Numbers
Open LibraryOL21934182M
ISBN 101558991123

(17) “Kinetics of Low Pressure Chemical Vapor Deposition of Tungsten Silicide from Dichlorosilane Reduction of Tungsten Hexafluoride”, D. Srinivas, G. B. Raupp and J. Hillman, in Tungsten and Other Advanced Metals for ULSI/VLSI Applications V, S. S. Wong and S. Furukawa, eds., Materials Research Society, Pittsburgh, PA, , pp. Tungsten is a grey-white metal with the highest melting point of all metals and excellent corrosion resistance. It is used in light bulb filaments, x-ray tubes, superalloys and radiation shielding. Its compounds are often used as industrial catalysts. Tungsten carbide is one of the hardest carbides and is used in cutting tools. We supply tungsten foil, powder, ribbon, rod, sheet, and wire.

Tungsten Composite Products -- CW70 Tungsten Composite Products -- CW70E Tungsten Composite Products -- CW75 Tungsten Composite Products -- CW78 Tungsten Composite Products -- CW Although they are somewhat more difficult to machine, tungsten carbide copper materials provide high mechanical properties and excellent resistance to erosion. A metal (from Greek μέταλλον métallon, "mine, quarry, metal") is a material that, when freshly prepared, polished, or fractured, shows a lustrous appearance, and conducts electricity and heat relatively well. Metals are typically malleable (they can be hammered into thin sheets) or ductile (can be drawn into wires). A metal may be a chemical element such as iron; an alloy such as.

Ganzhou, China, Aug - Today, Jiangxi Rare Metals Tungsten Group Holding Co. Ltd. (JXTC), one of China's largest tungsten mine operators, and H.C. Starck, one of the world's leading manufacturers of technology metals, celebrated the groundbreaking ceremony for their tungsten joint venture in Ganzhou City, Jiangxi Province, China. U.S. Department of the Interior U.S. Geological Survey. Metal Prices in the United States Through


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Tungsten and other advanced metals for ULSI applications in 1990 by Workshop on Tungsten and Other Advanced Metals for ULSI Applications in 1990 (1990 Dallas) Download PDF EPUB FB2

Get this from a library. Tungsten and other advanced metals for ULSI applications in proceedings of the workshop held October, Dallas, Texas, U.S.A. ; sponsored by Continuing Education in Engineering, University Extension, University of California, Berkeley and Texas Instruments, Inc., Dallas, Texas.

[Gregory C Smith; Roc Blumenthal; Materials Research Society.;]. Hasper, A, Kleijn, CR, Holleman, J & Middelhoek, JW-LPCVD step coverage and modelling in trenches and contact holes, tungsten and other advanced metals for VLSI/ULSI applications V. in Materials Research by: 4.

C.R. Kleijn, A. Hasper, J. Holleman, C.J. Hoogendoorn and J. Middelhoek () “An experimental and modelling study of the tungsten LPCVD growth kinetics from H 2-WFg at low WF 6 partial pressures”, in “Tungsten and other advanced metals for VLSI/ULSI applications V”, S.

Wong and S. Furukawa (eds), The Materials Research Society Author: Chris R. Kleijn, Christoph Werner. E.J. McInerney, P. Geraghty and S. Kang () “Modeling of WF 6 surface concentration and its effects on the step coverage of hydrogen reduced tungsten films” in “Tungsten and Other Advanced Metals for VLSI/ULSI Applications V”, S.S.

Wong and S. Furukawa (eds.), pp. –, The Materials Research Society, Pittsburgh Google ScholarCited by: 1. Applications of Finite Element Methods for Reliability Studies on ULSI Interconnections provides a detailed description of the application of finite element methods (FEMs) to the study of ULSI interconnect reliability.

Over the past two decades the application of FEMs has become widespread and continues to lead to a much better understanding of reliability physics.

To help readers cope with. Advanced Metallization for Ulsi Applications in Proceedings of the Conference Held October, San Diego, California, U.S.A., and Yosi Shacham-Diamand, Yasuhiro Horiike, David P. Favreau, Yosi Shacham-Diamand, Yasuhiro Horiike, David P. Favreau, Berkeley Continuing Education in engineering University of California.

Krishna Shenai is the author of Introduction to Database and Knowledge-B ( avg rating, 0 ratings, 0 reviews, published ), VLSI Metallization ( : Advanced Metallization for ULSI Applications in Volume 9 (MRS Proceedings) (): Favreau, David P., Sacham-Diamand, Yosi, Horiike, Yasuhiro: Books Skip to main content Try Prime.

Discover Book Depository's huge selection of Materials Research Society books online. Free delivery worldwide on over 20 million titles. Tungsten and Other Advanced Metals for ULSI Applications in Volume 6. Gregory C.

Smith. 01 Mar Hardback. US$ The kinetics of tungsten low‐pressure chemical‐vapor deposition (LPCVD) using WF 6 and SiH 4 have been studied in a vertical hot‐wall reactor equipped with a microbalance.

In situ growth‐rate measurements were performed by monitoring the sample weight during tungsten film deposition. The kinetics of the LPCVD process appear to be determined by the ratio of the partial pressures of SiH Cited by: Tungsten and Other Advanced Metals for ULSI Applications in Volume 6 Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements.

It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano.

Tungsten and Other Advanced Metals for ULSI Applications in Volume 6 by. G.C. Smith (Editor), R. Blumenthal (Editor) avg rating — 0 ratings — published Want to Read /5(8).

Hogle and P. Brown, Tungsten and Other Advanced Metals for ULSI Applications in (Materials Research Society, Pittsburgh, PA, ), pp.

47– Google Scholar by: 1. Formation of compositionally uniform tungsten silicide films using dichlorosilane in a single‐wafer reactor D. Malinaric, R. Williams, J. Schmitz, and E. Bromley, in Tungsten and Other Advanced Metals for ULSI Applications inedited by G.

Smith and R. Blumenthal (Materials Research Society,().Cited by: 6. B.T. Khuri-Yakub, K. Saraswat, Y. Lee and S. Bhardwaj, "photoacoustic Technique for Thin Film Thickness and Temperature Measurements in Semiconductor Processing," Workshop on Tungsten and Other Advanced Metals for ULSI Applications VII, Dallas, October MICRO-VOLUME MASS SPECTROMETRY", Proc.

of the Workshop on Tungsten and other Advanced Metals for ULSI Applic ations (T. Cale and F. Pintchoviski, ed.); Materials Research Society; Pittsburgh, PA () pp.

G.C. Smith, R. Blumenthal (Eds.), Tungsten and Other Advanced Metals for VLSO Applications inMaterials Research Society, Pittsburgh, PA (), p. Google Scholar 2Cited by: "Characterization of Ti-Si-N and W-Si-N barrier metals for Cu interconnects", T.

Iijima, Y. Shimooka, and K. Suguro, in "Advanced Metallization and Interconnect Systems for ULSI Applications in ", Oct.Portland, Oregon, ed.

Russell Ellwanger, Shi-Qing Wang. Used in resistance brazing and high temp applications. Used as counter weights and counter balances, radiation shielding components, tool shanks for boring bars and other tools for chatter-free machining.

Data provided by Mi-Tech Metals. Key Words: Class 1 Tungsten Alloys; AMS B: Vendors. Tungsten nitride was deposited on a silicon () substrate in a gas mixture of WF6-NH3-H2 (in Ar) at kPa.

The tungsten nitride films were analyzed by scanning electron microscopy, X-ray. The hydrogen reduction of tungsten hexafluoride is one-half order in hydrogen, zero order in tungsten hexafluoride, and has an activation energy of 73, J mol** minus **1 at temperatures from.G.

C. Smith and R. Blumenthal, Tungsten and Other Advanced Metals for ULSI Applications, MRS Conference Proc. (Materials Research Society, Pittsburgh, ). Google Scholar; 5. R. Blewer and T. Headly, Proceedings of the Workshop on Tungsten and Other Refractory Metals for VLSI Applications III (Materials Research Society, Pittsburg, Author: Ardy Sidhwa, Chuck Spinner, Todd Gandy, Steve Melosky, William Brown, Simon Ang, Hameed Naseem, Rich.Fastmarkets MB price book contains over global metal prices including steel prices and scrap prices.

Please enter your email address below to start a free trial to access this powerful metals pricing tool. Start your 7 day free trial to Fastmarkets MB today >> View over global steel and metals reference prices.